The Bruker Dimension ICON SPM operates in a scanning probe configuration and is therefore able to accommodate samples up to 210mm in diameter with a thickness up to 15mm. Depending on the sample, the scan size can be up to 100µm2 (with a maximum feature height of ~10µm). The ICON is contained within a very effective vibration isolation unit, which allows for Z resolution of ~1nm. The ICON is equipped with proprietary ScanAsyst® image optimization technology which makes the system very easy to use and allows for consistent results.
The Carl Zeiss AURIGA® CrossBeam® Workstation (installed in 2011) is a sophisticated multi-functional platform based on a high performance field emission scanning electron microscope (FESEM) combined with a powerful focused ion beam (FIB) system operating in the analogue mode. It is equipped with an advanced Oxford Instruments’ X-Max large area (20mm2) silicon drift detector (SDD) energy dispersive spectrometer (EDS) and a super high speed NordlysF detector electron back-scattered diffraction (EBSD) analytical system.
For training in the use of any of the specimen preparation equipment please speak to EMU staff.
Materials Specimen Preparation
· Gatan PIPS II Model 695
· Hitachi IM4000 Ion Milling System
· Buehler IsoMet 1000 Precision Saw
· Struers Secotom-10 Saw
· Struers LaboPol 5
· Ultrasonics Ultrasonicator
· Struers Tenupol-3 Electropolishing Unit
The FEI xT Nova NanoLab 200 combines a high resolution focussed ion beam (FIB) and a high resolution field emission scanning electron microscope (FESEM). It was installed in 2004 and is a flagship instrument of Australian Microscopy and Microanalysis Research Facility (AMMRF). It was upgraded to PIA mode in 2011 for higher precision of ion milling on a new operating system.
The NanoSEM 230 is a field-emission scanning electron microscope (FE-SEM), which attains ultra-high imaging resolution without the specimen size restrictions of a conventional in-lens FE-SEM due to the advanced design of the electron optics. The NanoSEM 450’s Schottky field-emission source allows the user to achieve high imaging resolution at a range of kV, at both low (high-resolution imaging) and high (microanalytical imaging) currents.
The NanoSEM 450 is a field-emission scanning electron microscope (FE-SEM), which attains ultra-high imaging resolution without the specimen size restrictions of a conventional in-lens FE-SEM due to the advanced design of the electron optics. The NanoSEM 450’s Schottky field-emission source allows the user to achieve high imaging resolution at a range of kV, at both low (high-resolution imaging) and high (microanalytical imaging) currents.
The FEI Quanta 200 is a particularly versatile tungsten-gun scanning electron microscope capable of operating in three different vacuum modes. It is most frequently used in a high vacuum (conventional) mode to examine dry conductive specimens. Alternatively, it may be used in a low vacuum (0.1-1.0 Torr) mode to examine dry specimens that are not inherently conductive and will not tolerate normal coating procedures. It is also possible, to operate in a “wet” or Environmental (1.0 – 20 Torr) mode. In this mode, controlling the interaction between the temperature of the cold stage with the pressure within the specimen chamber, enables humidity to be maintained around the specimen during imaging. There are several imaging limitations imposed when the microscope is operated in “wet mode” therefore a research proposal (detailing the desired operating conditions) should be submitted for discussion prior to seeking ‘wet mode’ imaging. For enquiries regarding SEM access and training, please contact Simon Hager.
The FEI Tecnai G2 20 TEM allows high resolution images to be obtained from thin (electron transparent) materials. The Tecnai TEM has a thermionic source (LaB6) and may be easily operated at different accelerating voltages. This makes it suitable for a wide range of specimens. The Tecnai TEM allows structural, crystallographic and elemental studies of materials. This microscope has a Bruker QUANTAX energy dispersive x-ray spectroscopy system interfaced to it and a BM Eagle digital camera for image acquisition. In addition, the microscope has a High Angle Annular Dark Field (HAADF) detector.
The FEI XP200 focused ion beam miller uses a fine, energetic beam of gallium ions that scan over the surface of a specimen. At high beam currents the gallium beam rapidly sputters away the specimen surface that allows subsurface cross-sections to be prepared. If the beam current is reduced, the secondary electrons or secondary ions emitted from the specimen surface, can be detected and used to form high resolution images.
EMU has two Hitachi S3400 SEMs – both are able to do imaging and X-ray microanalysis. These instruments are fitted with secondary and backscatter electron detectors that allow for topographic and compositional (atomic number contrast) surface imaging of samples. These microscopes are routinely used for imaging from ~20x to ~20,000x magnification. The S3400 SEMs are predominantly used in high-vacuum mode, but also have a variable-pressure or “natural” mode that can be useful when imaging vacuum-sensitive specimens or specimens with conductivity problems.
The JEOL 7001F is a Schottky field emission scanning electron microscope. The Schottky field emission electron gun produces a very finely focused, high current electron beam suitable for specialist high resolution microstructural analysis of inorganic materials. The "below lens" configured 7001F can accommodate specimens of up to 25mm in diameter, but specimen tilt is restricted because of the presence of a number of specialist microanalytical detectors within the specimen chamber.
JEOL JSPM 5400 MkII is an environmental Scanning Probe Microscope which is configured for observation and nano-characterisation of inorganic and device materials. The JEOL JSPM 5400 MkII eAFM has a number of piezo-scanners and a range of atomic force imaging modes which may be operated in ambient and high vacuum conditions (~10-6 Pa) enabling control of environmental conditions (pressure and temperature) during imaging. Some examples of the imaging modes available include contact, intermittent contact and non-contact topography imaging.
The JEOL JXA-8500F is a powerful microanalytical instrument that provides area-specific quantitative elemental results down to the sub-micron level. The electron probe microanalyser (EPMA) is fitted with four wavelength dispersive spectrometers (WDS) and a JEOL silicon drift detector energy dispersive spectrometer (SDD-EDS), giving this instrument the capability to detect and measure the concentration of most elements in the periodic table Z=4), with detection limits often better than <0.05%. In addition to its conventional microprobe capabilities, the instrument’s Schottky field-emission gun allows non-conventional low-kV work to be undertaken while maintaining a stable, highly-focused, high current (up to >100nA) beam.
Quantitative analysis may be carried out on the bulk matrix of micro-sampled materials as well as on phases, inclusions, grain boundaries or precipitates in a matrix. Examples of materials analysed using the JXA-8500F include geological specimens, fuel cells, implantable bionics, archaeological artefacts, metals/alloys and glasses.
Sample holders are available that accommodate 26mm (1") diameter resin-mounted specimens and petrographic thin sections/wafers. Samples need to be dry, flat, conductive and vacuum-stable for EPMA analysis. Usually, small pieces of an item are embedded in resin or mounted on a glass slide, polished to a mirror finish and then coated with a layer of carbon for conductivity.
This instrument was funded through the NCRIS program and is available to researchers nationwide via the AMMRF network (www.ammrf.org.au). For more information about instrument capabilities, access, and for specimen preparation advice, please contact Karen Privat.
The JEOL 1400 transmission electron microscope operates at accelerating voltages up to 120kV. The microscope is equipped with a high contrast lens configuration especially suited to imaging biological, medical or polymer specimens that lack electron density and inherent contrast. Specimens undergo preparation procedures to ensure they are 100 nm or thinner in order to transmit the electron beam. Dense regions within the specimen cause electrons to scatter and an aperture, positioned near the specimen in the electron column, prevents the scattered electrons from reaching the imaging plane.
The Philips CM200 field emission transmission electron microscope allows very high resolution images to be obtained from thin (electron transparent) materials. In a field emission gun a very strong electric field is used to extract electrons from a metal filament. This results in an electron beam which is very bright. Ultimately, this microscope allows individual atoms to be imaged. The CM200 TEM allows structural, crystallographic and elemental studies of materials.