Instruments

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EPMA - JEOL JXA-8500F Field-Emission SEM-EPMA Hyperprobe (WDS & SDD-EDS)

EPMA - JEOL JXA-8500F Field-Emission SEM-EPMA Hyperprobe (WDS & SDD-EDS)

The JEOL JXA-8500F is a powerful microanalytical instrument that provides area-specific quantitative elemental results down to the sub-micron level. The electron probe microanalyser (EPMA) is fitted with four wavelength dispersive spectrometers (WDS) and a JEOL silicon drift detector energy dispersive spectrometer (SDD-EDS), giving this instrument the capability to detect and measure the concentration of most elements in the periodic table Z=4), with detection limits often better than <0.05%.

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FIB - Carl Zeiss AURIGA® CrossBeam® Workstation

FIB - Carl Zeiss AURIGA® CrossBeam® Workstation

The Carl Zeiss AURIGA® CrossBeam® Workstation (installed in 2011) is a sophisticated multi-functional platform based on a high performance field emission scanning electron microscope (FESEM) combined with a powerful focused ion beam (FIB) system operating in the analogue mode. It is equipped with an advanced Oxford Instruments’ X-Max large area (20mm2) silicon drift detector (SDD) energy dispersive spectrometer (EDS) and a super high speed NordlysF detector electron back-scattered diffraction (EBSD) analytical system.

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FIB - FEI Nova Nanolab 200

FIB - FEI Nova Nanolab 200

The FEI xT Nova NanoLab 200 combines a high resolution focussed ion beam (FIB) and a high resolution field emission scanning electron microscope (FESEM). It was installed in 2004 and is a flagship instrument of Australian Microscopy and Microanalysis Research Facility (AMMRF).  It was upgraded to PIA mode in 2011 for higher precision of ion milling on a new operating system.

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SEM - FEI Nova NanoSEM 230 FE-SEM

SEM - FEI Nova NanoSEM 230 FE-SEM

The NanoSEM 230 is a field-emission scanning electron microscope (FE-SEM), which attains ultra-high imaging resolution without the specimen size restrictions of a conventional in-lens FE-SEM due to the advanced design of the electron optics. The NanoSEM 450’s Schottky field-emission source allows the user to achieve high imaging resolution at a range of kV, at both low (high-resolution imaging) and high (microanalytical imaging) currents.

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SEM - Hitachi S3400

SEM - Hitachi S3400

EMU has two Hitachi S3400 SEMs – both are able to do imaging and X-ray microanalysis. These instruments are fitted with secondary and backscatter electron detectors that allow for topographic and compositional (atomic number contrast) surface imaging of samples. These microscopes are routinely used for imaging from ~20x to ~20,000x magnification. The S3400 SEMs are predominantly used in high-vacuum mode, but also have a variable-pressure or “natural” mode that can be useful when imaging vacuum-sensitive specimens or specimens with conductivity problems.

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TEM - FEI Tecnai G2 20 TEM

TEM - FEI Tecnai G2 20 TEM

The FEI Tecnai G2 20 TEM allows high resolution images to be obtained from thin (electron transparent) materials. The Tecnai TEM has a thermionic source (LaB6) and may be easily operated at different accelerating voltages. This makes it suitable for a wide range of specimens. The Tecnai TEM allows structural, crystallographic and elemental studies of materials.

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TEM - JEOL TEM-1400

TEM - JEOL TEM-1400

The JEOL 1400 transmission electron microscope operates at accelerating voltages up to 120kV. The microscope is equipped with a high contrast lens configuration especially suited to imaging biological, medical or polymer specimens that lack electron density and inherent contrast. Specimens undergo preparation procedures to ensure they are 100 nm or thinner in order to transmit the electron beam. Dense regions within the specimen cause electrons to scatter and an aperture, positioned near the specimen in the electron column, prevents the scattered electrons from reaching the imaging plane.

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TEM - Phillips CM200

TEM - Phillips CM200

The Philips CM200 field emission transmission electron microscope allows very high resolution images to be obtained from thin (electron transparent) materials. In a field emission gun a very strong electric field is used to extract electrons from a metal filament. This results in an electron beam which is very bright. Ultimately, this microscope allows individual atoms to be imaged. The CM200 TEM allows structural, crystallographic and elemental studies of materials.

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EMU Specimen Preparation Equipment

The EMU specimen preparation suite includes equipment designed for specimen preparation for microscopy, in addition to basic lab equipment. For training or access to any of these pieces of equipment, please speak to EMU staff.

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AFM - Bruker Dimension ICON SPM

AFM - Bruker Dimension ICON SPM

The Bruker Dimension ICON SPM operates in a scanning probe configuration and is therefore able to accommodate samples up to 210mm in diameter with a thickness up to 15mm. Depending on the sample, the scan size can be up to 100µm2 (with a maximum feature height of ~10µm). The ICON is contained within a very effective vibration isolation unit, which allows for Z resolution of ~1nm. The ICON is equipped with proprietary ScanAsyst® image optimization technology which makes the system very easy to use and allows for consistent results.

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TEM - JEOL JEM-F200 Multi-Purpose FEG-S/TEM

TEM - JEOL JEM-F200 Multi-Purpose FEG-S/TEM

The JEOL JEM-F200 (installed in 2017) is a cold field emission gun (FEG) scanning transmission electron microscope (S/TEM) that operates at 200 kV (with an option of opearating at 80 kV under special request). The high brightness and coherence of the cold FEG mean that this microscope is ideally suited for analytical microscopy of materials. The F200 has a lattice resolution of 0.16 nm in ADF STEM mode and 0.1 nm in TEM mode at 200 kV.

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